Bandpass Filter Fabrication and Research on Anti-Radiation Performance

Citation

赵会聪 (Zhao Huicong). (2014年7月). 带通滤光片的镀制及抗辐照性能研究 [Bandpass Filter Fabrication and Research on Anti-Radiation Performance] (硕士学位论文) [Master's Thesis/Dissertation]. 哈尔滨工业大学 [Harbin Institute of Technology].

Keywords

• 带通滤光片 / Bandpass Filter
• 膜系设计 / Film Structure Design
• 双截止组合结构 / Double Cut-off Composite Structure
• ZnS / 硫化锌
• MgF2 / 氟化镁
• 沉积温度 / Deposition Temperature
• 电子束真空镀膜 / Electron Beam Vacuum Deposition
• 1MeV 电子辐照 / 1MeV Electron Irradiation
• 透过率光谱 / Transmittance Spectrum
• 抗辐照性能 / Anti-Radiation Performance
• 基底玻璃 / Substrate Glass
• 空间带电粒子 / Space Charged Particles
• 着色效应 / Coloring Effect
• 通带 / Passband
• 截止带 / Cut-off Band
• 膜材 / Film Material
• 光学薄膜 / Optical Thin Film

Brief

The thesis details the design and fabrication of a 400-800nm bandpass filter using electron beam evaporation with ZnS and MgF2 thin films, and evaluates its resistance to 1MeV electron irradiation, noting the impact of deposition temperature on film properties and the filter's anti-radiation performance compared to the substrate glass.

Summary

This thesis focused on the design and fabrication of a 400-800nm bandpass filter using electron beam evaporation with ZnS and MgF2 thin films. The study investigated the impact of deposition temperature on the properties of the ZnS and MgF2 single layers and determined the optimal deposition temperature to be 250℃. The fabricated bandpass filter, which employed a double cut-off composite structure, was then subjected to 1MeV electron irradiation to assess its anti-radiation performance. The results indicated that the bandpass filter exhibited better resistance to radiation-induced transmittance loss compared to the substrate glass.

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