Design and manufacture of a bandpass filter with high transmittance and steep edge on both sides

Citation

王瑞生 (Wang Ruisheng), 吕少波 (Lü Shaobo), 阴晓俊 (Yin Xiaojun), 赵帅锋 (Zhao Shuaifeng), & 孙言 (Sun Yan). (年代不详). 高透射双侧锐截止带通滤光片的设计制造 [Design and manufacture of a bandpass filter with high transmittance and steep edge on both sides]. 沈阳仪表科学研究院有限公司 (Shenyang Academy of Instrumentation Science co., Ltd), 汇博光学 (HB Optical), 辽宁沈阳 110043 [Shenyang, Liaoning 110043, China].

Keywords

  • 带通滤光片 / Bandpass Filter
  • 双侧锐陡度 / Steep edge on both sides
  • 截止陡度 / End-range/Blocking slope/Steepness of both blocking slope
  • 高透射 / High transmittance
  • Nb2O5 and SiO2
  • 152 层 / 152 layers
  • 16 腔 / 16 cavities
  • 膜厚监控 / Film thickness monitoring
  • 直接光控 / Direct optical monitoring control
  • 等离子体辅助反应磁控溅射 / Plasma assisted reactive magnetic sputtering

Brief

This article details the design and fabrication of a 152-layer, 16-cavity bandpass filter using Nb2O5 and SiO2, achieving high transmittance (95.4%) and steep cut-off slopes (<λ/100) through a hybrid thickness control method and plasma-assisted reactive magnetron sputtering.

Summary

This article details the design and manufacture of a high-performance bandpass filter composed of 152 layers of Nb2O5 and SiO2. The filter, featuring 16 (or 12) cavities, achieves high peak transmittance (95.4%) and sharp cut-off slopes (<λ/100) on both sides of the passband. The fabrication process utilized a combination of direct optical and time control for film thickness, which was validated through simulation to have an error of less than ±0.1%. The filter was manufactured using a plasma-assisted reactive magnetron sputtering coating machine.

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