Design and Preparation of High Performance Long Wave Infrared Narrow-band Filter

Design and Preparation of High Performance Long Wave Infrared Narrow-band Filter

Citation

董茂进 (Dong Maojin), 熊玉卿 (Xiong Yuqing), 王多书 (Wang Duoshu), 王济洲 (Wang Jizhou), 李晨 (Li Chen). 高性能长波红外窄带滤光片的设计与镀制 (Design and Preparation of High Performance Long Wave Infrared Narrow-band Filter) [R]. 兰州空间技术物理研究所 真空技术与物理重点实验室 (Science and Technology on Vacuum Technology and Physics Laboratory，Lanzhou Institute of Physics), 2024.

Keywords

  • 长波红外窄带滤光片 / Long wave infrared narrow-band filter
  • 光学薄膜 / Optical thin film
  • 多半波结构 / Multi-half-wave structure
  • 局部优化 / Local optimization
  • 空间相机 / Space camera
  • 扫描仪 / Scanner
  • 带通滤光片 / Band-pass filter
  • 截止 / Cut-off
  • 透射率 / Transmittance
  • 等离子体辅助沉积 / Plasma-assisted deposition
  • 电阻蒸发 / Resistance evaporation
  • Ge / Germanium
  • ZnS /Zinc sulfide
  • PbTe / Lead telluride
  • 膜系设计 / Film system design
  • 谐振腔 / Resonant cavity
  • 光学监控 / Optical monitoring
  • 环境稳定性 /Environmental stability
  • 遥感技术 / Remote sensing technology
  • 光谱仪 / Spectrometer
  • 红外相机 / Infrared camera
  • 成像仪 / Imager
  • 多光谱成像仪 / Multispectral imager
  • 离子源 / Ion source
  • 真空镀膜机 / Vacuum coating machine
  • 截止膜系 / Cut-off film system
  • 通带波纹 / Passband ripple

Brief

This article describes the design and preparation of a high-performance long-wave infrared narrowband filter using a multi-half-wave structure with local optimization and plasma-assisted resistance evaporation deposition, achieving high transmittance in the 8.05-8.35µm range and good out-of-band rejection for applications in space cameras and scanners.

Summary

This article discusses the design and fabrication of a high-performance long-wave infrared (LWIR) narrowband filter for use in space cameras and scanners. The filter was designed using a multi-half-wave structure with local optimization and manufactured using a plasma-assisted resistance evaporation deposition process. The resulting filter achieved a high average transmittance of 83.2% in the 8.05-8.35µm spectral range and good cutoff performance with average transmittance less than 0.5% below 7.95µm and between 8.45-14.00µm. The study highlights the simplicity of the film system due to the multi-half-wave structure, which facilitates the manufacturing process.

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