Design of Vacuum Ultraviolet Reflecting Stack and Bandpass filter in the visible region
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Citation
戴佳鑫 (Dai Jiaxin). 真空紫外高反膜系和可见光带通滤光片设计 (Design of Vacuum Ultraviolet Reflecting Stack and Bandpass filter in the visible region). 硕士学位论文 (Master's thesis), 合肥工业大学 (Hefei University of Technology), 二〇一二年三月 (March 2012).
Keywords
- Vacuum ultraviolet (VUV)
- High-reflectance film/stack
- Multilayer films
- "逐层法" (Layer-by-Layer method)
- Rh-Si
- Reflectance
- 50-200nm
- Film thickness error
- Visible light
- Bandpass filter
- Center wavelength (505nm)
- Passband (500-510nm)
- TiO2
- SiO2
- Peak transmittance (98.36%)
- Passband width (10nm)
Brief
This article details the design and analysis of both high-reflectance multilayer films for the vacuum ultraviolet region (50-200nm) using a "layer-by-layer" method with Rh-Si achieving an average reflectance of 67.9% and a bandpass filter for the visible region (500-510nm) using TiO2 and SiO2 resulting in a peak transmittance of 98.36%.
Summary
High-reflectance multilayer films for the vacuum ultraviolet (VUV) region (50-200nm), designed using a "layer-by-layer" method with Rh and Si materials. This design achieved a high average reflectance of 67.9% across the entire band. The study also compared Rh-Si to other material combinations and analyzed the impact of film thickness errors on reflectance.
A bandpass filter for the visible light region (500-510nm), designed using TiO2 as the high refractive index material and SiO2 as the low refractive index material. The final design, (HLLHHHLHHL) with a central wavelength of 505nm, achieved a peak transmittance of 98.36% and a passband width of 10nm. The design process involved analyzing material properties and comparing different analytical design results.
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