Fabrication of dual-band cut-off for visible bandpass filter

Fabrication of dual-band cut-off for visible bandpass filter

Citation

齐健 [Qi Jian], 苏宙平 [Su Zhou-ping], 胡立发 [Hu Li-fa], 朱华新 [Zhu Hua-xin], 何一峰 [He Yi-feng]. 双截止透可见带通滤光片研制 [Fabrication of dual-band cut-off for visible bandpass filter]. 激光与红外 (Laser & Infrared), 2019, 49(12): 1472-1477.

Keywords

  • 双截止透可见带通滤光片 / Dual-band cut-off visible bandpass filter
  • 蓝宝石基底 / Sapphire substrate
  • 截止带波长 / Cut-off band wavelength
  • 通带波长 / Passband wavelength
  • TiO2 / Titanium dioxide
  • SiO2 / Silicon dioxide
  • 薄膜 / Thin film
  • 膜系设计 / Film system design
  • 电子束蒸发物理气相沉积 / Electron beam physical vapor deposition - EBPVD
  • 透射率 / Transmittance
  • 截止深度 / Cut-off depth
  • 通带平均透过率 / Average transmittance of the passband
  • 半宽度 HFWD / Half Width at Full Maximum - HFWD
  • 半波孔 / Half-wave hole
  • 对称周期膜系 / Symmetric periodic film system
  • 等效折射率 / Equivalent refractive index
  • 截止带宽 / Cut-off bandwidth
  • 吸收系数 / Absorption coefficient
  • 折射率 / Refractive index
  • 色散曲线 / Dispersion curve

Brief

This article details the design and fabrication of a dual-band cut-off filter on a sapphire substrate using TiO2 and SiO2 thin films deposited via electron beam evaporation to achieve high transmittance in the visible range (0.4-0.8 μm) and effective blocking of near-ultraviolet (0.3-0.4 μm) and near-infrared (0.8-1.1 μm) wavelengths.

Summary

This paper describes the design, fabrication, and testing of a dual-band cut-off filter on a sapphire substrate using TiO2 and SiO2 thin films deposited via electron beam evaporation. The filter is designed to transmit visible light (0.4-0.8 μm) with high efficiency while blocking near-ultraviolet (0.3-0.4 μm) and near-infrared (0.8-1.1 μm) wavelengths, achieving good cut-off depths and effectively suppressing the "half-wave hole" phenomenon. The fabricated filter demonstrated high average transmittance (97.68%) in the passband and good stability in environmental tests.

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