Scattering Properties of Low-Loss 1064nm Bandpass Filter Multilayer Films

Scattering Properties of Low-Loss 1064nm Bandpass Filter Multilayer Films

Citation

刘冬梅 (Liu Dongmei), 罗云峰 (Luo Yunfeng), 付秀华 (Fu Xiuhua), 鲍刚华 (Bao Ganghua), 张静 (Zhang Jing), & 卢成 (Lu Cheng). (2021年5月). 低损耗１０６４ｎｍ带通滤光片多层膜的散射特性研究 [Scattering Properties of Low-Loss 1064nm Bandpass Filter Multilayer Films]. 中国激光 [Chinese Journal of Lasers], 48(9), 0903004. doi: 10.3788/CJL202148.0903004

Keywords

  • 1064nm带通滤光片 / 1064nm Bandpass Filter
  • 多层膜 / Multilayer Films
  • 散射特性 / Scattering Characteristics
  • 低损耗 / Low Loss
  • TiO2 / 二氧化钛
  • SiO2 / 二氧化硅
  • 氧分压 / Oxygen Partial Pressure
  • 离子辅助制备 / Ion-Assisted Deposition
  • 表面粗糙度 / Surface Roughness
  • 界面散射 / Interface Scattering
  • 标量散射理论 / Scalar Scattering Theory
  • 完全相关 / Complete Correlation

Brief

This article investigates the scattering characteristics of low-loss 1064nm bandpass filter multilayer films prepared using TiO2 and SiO2 under different oxygen partial pressures, finding that using the same oxygen partial pressure during deposition leads to reduced scattering and improved transmission due to a more stable ion beam source.

Summary

This article investigates the scattering characteristics of low-loss 1064nm bandpass filter multilayer films composed of TiO2 and SiO2. The researchers prepared these films using ion-assisted deposition under two conditions: the same oxygen partial pressure for both materials and different oxygen partial pressures. They found that using the same oxygen partial pressure resulted in lower surface roughness, more uniform film layers, and better transmittance. This improvement is attributed to a more stable Kaufman ion source operation, leading to reduced interface scattering. Conversely, alternating oxygen partial pressures caused an unstable ion beam, increased interface roughness, and thus higher scattering losses. The study used scalar scattering theory to model the transmittance of the films under both completely correlated and incompletely correlated interface roughness conditions, with the theoretical models showing good agreement with the experimental results. Ultimately, the research highlights the importance of maintaining a stable deposition environment, particularly a constant oxygen partial pressure, to minimize scattering and produce high-performance low-loss 1064nm bandpass filters.

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