What is KrF excimer laser?

KrF Excimer Laser

The KrF excimer laser refers to a type of gas laser utilizing a combination of krypton (Kr) and fluorine (F) gases to generate ultraviolet (UV) light with a principal wavelength of 248 nanometers (nm). Excimer lasers, short for 'excited dimers', operate by exciting a dimeric (molecular pair) compound to form a laser medium that, upon returning to its ground state, emits photons to produce laser light.

Operation Principle

In KrF excimer lasers, the active laser medium is formed when a mixture of krypton and fluorine gases is electrically excited, generating krypton fluoride, a compound in an excited state. This state is highly unstable, and when the molecule transitions back to its ground state, it releases a photon at 248 nm, creating UV light. The process is highly efficient, making KrF excimer lasers powerful sources of pulsed UV radiation.

Applications

• Lithography in semiconductor manufacturing, enabling the production of microprocessors and memory chips with fine features.
• Precision micromachining of materials, including the crafting of medical devices and microfluidic components.
• Laser surgery, particularly in ophthalmology for procedures like LASIK, due to its precision and minimal tissue damage.
• Spectroscopy and laboratory research for investigating molecular and atomic structures.

Advantages

• High precision and control over the machining process.
• Minimal thermal damage to surrounding tissues or materials.
• Ability to work with a wide range of materials.
• Key technology in advancing miniaturization in electronics.

Specifications

In summary, the KrF excimer laser represents a critical advancement in the field of optical engineering, offering unparalleled precision and efficiency in generating ultraviolet light. Its diverse applications highlight its importance across various high-tech industries, from semiconductor manufacturing to medical surgeries.