Preparation of Long-pass Filter Based on Gene Fluorescence Detection
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Citation
Keywords
- 长波通滤光片 / Long-wave pass filter
- 基因荧光检测 / Gene fluorescence detection
- 光学薄膜 / Optical thin film
- 膜系设计 / Film system design
- 薄膜制备工艺 / Thin film preparation process
- 电子束蒸发 / Electron beam evaporation
- 离子辅助沉积 / Ion-assisted deposition
- Ta2O5 / Tantalum pentoxide
- SiO2 / Silicon dioxide
- JGS1基底 / JGS1 substrate
- 截止中心 λ0=520 nm / Cut-off center λ0=520 nm
- 透射带 λ=530750 nm / Transmission band λ=530750 nm
- 膜层敏感度 / Membrane layer sensitivity
- 电场分布 /Electric field distribution
- 晶控方案 /Crystal control scheme
- 光谱透过率 /Spectral transmittance
- 膜堆周期 /Film stack cycles
- 截止带 / Cut-off band
- 透射率 / Transmittance
- 反射率 /Reflectivity
- 对称膜堆 /Symmetric film stack
- 等效折射率 / Equivalent refractive index
- 光学厚度 / Optical thickness
- 分光光度计 / Spectrophotometer
- 增透膜 / Anti-reflection coating
Brief
This article details the design and successful fabrication of a long-wave pass filter on a JGS1 substrate for gene fluorescence detection, achieving high reflection at 520 nm and high transmission in the 530-750 nm range using electron-beam evaporation with ion-assisted deposition of Ta2O5 and SiO2 thin films.
Summary
This article describes the design, fabrication, and testing of a long-wave pass filter on a JGS1 substrate for gene fluorescence detection. Using electron-beam evaporation with ion-assisted deposition of Ta2O5 and SiO2, the researchers achieved high reflectivity (99.77%) at 520 nm and high average transmittance (98.58%) in the 530-750 nm range, meeting the requirements for precise separation of excitation and emission wavelengths in gene detection. The study also details the optimization process, including 膜系设计 (film system design), addressing 膜层敏感度 (membrane layer sensitivity), and refining the 晶控方案 (crystal control scheme) to improve the filter's performance.
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