MVBP193-20 대역통과 필터(CWL=193nm, FWHM=20nm)

Semiconductor Lithography & Inspection

• 193 nm is the standard wavelength for "ArF Immersion Lithography," used to manufacture modern microchips/integrated circuits.
• This filter would be used in inspection systems, metrology equipment, or beam diagnostics to isolate the laser line and block ambient light.

Recommend Light Sources

• ArF Excimer Laser (193 nm): The primary, high-power source for this specific wavelength.
• Deuterium Lamp (D2 Lamp): The standard broadband light source for UV spectroscopy. It outputs a continuous spectrum from ~180 nm to 400 nm, covering the filter's passband.
• Laser-Driven Light Source (LDLS): A high-brightness, broadband source (plasma light source) that provides strong output in the deep UV (170 nm+) compared to traditional lamps.
• Xenon Flash Lamp (High Performance): Some high-end Xenon flash lamps can emit down to 190 nm if they have a UV-grade fused silica envelope, but they are less efficient than Deuterium at this specific wavelength.

Medical (Ophthalmology)

• Used in LASIK and PRK vision correction surgery. The cornea absorbs 193 nm light efficiently, allowing for precise tissue ablation without heating deeper structures. The filter could be used in beam delivery systems or energy monitors.

Recommended Light Source

• Argon Fluoride (ArF) Excimer Laser