LP360 롱패스 필터(T>90%@370-1200nm, OD3@200-350nm)

Photolithography (Mask Alignment)

This is one of the most common industrial applications for an LP360.

• Function: In photolithography, photoresists are sensitive to specific "lines" of UV light produced by mercury lamps. An LP360 filter is often used to block the deep UV radiation (which can cause degradation or unwanted exposure effects) while transmitting the critical i-line (365nm), h-line (405nm), and g-line (436nm).
• Why this filter? It perfectly separates the damaging Deep UV (<350nm) from the functional Near UV (365nm+).

Recommended Light Sources

You need a broadband source that contains the strong spectral lines this filter is designed to transmit.

• Mercury Arc Lamps (High Pressure): These are the standard. They emit strong peaks at 365nm (passed), 405nm (passed), and 436nm (passed), as well as deep UV peaks (blocked by the filter).
• Metal Halide Lamps: Often used in curing; the filter shapes the output to remove the more hazardous shortwave UV.

Deep UV Fluorescence Imaging (Emission Side)

• Function: If you are inducing fluorescence using a Deep UV source (e.g., 250nm–340nm), you need a filter on the camera/sensor to block that excitation light so it doesn't wash out the image.
• Why this filter? The LP360 blocks the excitation (Deep UV) but passes the resulting emission, even if that emission is in the UV-A range (e.g., 360nm–380nm) or the visible range.

Recommended Light Sources

You need a source that emits in the filter's blocked region.

• Deep UV LEDs: 255nm, 265nm, 280nm, 310nm, or 340nm.
• Xenon Flash Lamps (Filtered): With a bandpass filter to select the 250–340nm range.