Collection: Filters for Laser Line Clean Up

Common used Laser Line and Wavelengths

Excimer Lasers:

• ArF: 193 nm (semiconductor lithography, precision cleaning of silicon wafers).
• KrF: 248 nm (removing photoresist residues and organic contaminants).
• XeCl: 308 nm (surface decontamination of medical devices).

Nd:YAG Lasers:

• Fundamental Wavelength: 1064 nm (industrial metal cleaning, removing rust and oxide layers).
• Second Harmonic (SHG): 532 nm (visible light for precision cleaning).
• Fourth Harmonic (FHG): 266 nm (ultra-precise cleaning of optical components).
• Third Harmonic (THG): 355 nm (semiconductor wafer cleaning, removing submicron particles).

Helium-Neon (He-Ne) Lasers:

• Red: 632.8 nm (alignment and inspection in electronics manufacturing).
• Green: 543.5 nm (laser marking on plastics).